Market Size in 2024 | Market Forecast in 2034 | CAGR (in %) | Base Year |
---|---|---|---|
USD 26.87 Billion | USD 57.04 Billion | 7.82% | 2024 |
The global chemical vapour deposition (CVD) equipment market size was worth around USD 26.87 Billion in 2024 and is predicted to grow to around USD 57.04 Billion by 2034 with a compound annual growth rate (CAGR) of roughly 7.82% between 2025 and 2034. The report analyzes the global chemical vapour deposition (CVD) equipment market's drivers, restraints/challenges, and the effect they have on the demands during the projection period. In addition, the report explores emerging opportunities in the chemical vapour deposition (CVD) equipment industry.
Chemical vapor deposition (CVD) equipment is a manufacturing device used during the process of chemical vapor deposition. In this process, thin films of various materials are deposited on solid substrates, such as silicon wafers. This assists in creating functional layers or coatings that provide specific properties. The equipment consists of a reactor or a chamber where the process of deposition takes place. The design of the device allows the creation of a controlled environment that has precise conditions allowing thin film deposition. CVD equipment can be customized depending on the final requirements. This helps in optimizing the process for specific materials and applications. CVD equipment is used in various industries such as semiconductor manufacturing, solar cells, optical coatings, and thin-film electronics. The choice of the process and the equipment depends entirely on desired film characteristics along with substrate material, and specific application requirements.
Increasing application in semiconductor industry to propel market demand
The global chemical vapor deposition (CVD) equipment market is projected to grow owing to the increasing application of the equipment in one of the fastest-growing and valuable sectors which is the semiconductor industry. There are several applications of CVD equipment in this sector. For instance, it is used in the deposition of thin film on semiconductor substrates. This includes materials such as silicon dioxide (SiO2), silicon nitride (Si3N4), and various metal films. They are important for the fabrication of transistor gates, interconnects, dielectric layers, and other components of integrated circuits (ICs). Moreover, the application of CVD equipment in the Epitaxial growth process has allowed more demand in the industry. In this process, a single-crystal layer is deposited on a silicon wafer. Other processes such as Low-Pressure Chemical Vapor Deposition (LPCVD) and Diffusion Barrier Deposition have also led to higher use of the device.
High initial investment to restrict market expansion
CVD equipment requires high initial investment due to the complex design of the machine. It is made of specialized components and has sophisticated control designs. Moreover, if the machine has to be customized depending on the user’s needs, the cost may go up even higher. This has led to restricted growth in the global chemical vapor deposition equipment industry especially in small and medium-sized end-user companies. Additionally, there is a growing segment of consumers showing an inclination toward other alternative methods such as physical vapor deposition (PVD) and atomic layer deposition (ALD).
Emerging use in nanotechnology to provide growth opportunities
The global chemical vapor deposition equipment industry can expect several growth opportunities owing to the increasing application of CVD equipment in nanotechnology which is fast gaining momentum in the science field. Nanotechnology applications are growing in various fields such as electronics, healthcare, energy, and materials science. CVD equipment is likely to play a crucial role in fabricating nanoscale structures and thin films with precise measurements.
Technological complexity to challenge the market expansion
The global sales volume of the chemical vapor deposition equipment market may be limited due to the high complexity associated with the technology since CVD processes involve complex chemical reactions and physical phenomena. It requires a deep understanding of materials science, deposition techniques, and process optimization. The development and maintenance of expertise in CVD technology can be a challenge due to the availability of a limited workforce.
The global chemical vapor deposition (CVD) equipment market is segmented based on type, material type, technology, application, end-user, and region.
Based on type, the global chemical vapour deposition (cvd) equipment market is divided into atmospheric pressure CVD, low pressure CVD, and ultrahigh vacuum CVD.
On the basis of material type, the global chemical vapour deposition (cvd) equipment market is bifurcated into metal, ceramic, and composite.
Based on technology, the global market segments are plasma-assisted and thermal. The industry witnessed the highest growth in the plasma-assisted segment in 2024. The technology is also known as plasma-enhanced CVD (PECVD) and it involves the use of plasma to optimize CVD processes. Plasma is created by energizing a gas using an electrical discharge. It leads to the formation of reactive species that assist in the deposition of thin films. The technology offers several benefits such as lower deposition temperatures, improved film quality, enhanced step coverage, and the ability to deposit a wide range of materials. Thermal CVD is also known as traditional CVD or LPCVD and relies on high temperatures to start and drive the chemical reactions for deposition. The temperature range in this process lies between 500°C to 1200°C.
Based on end-user, the chemical vapor deposition equipment is divided into cutting tools, electronics, aerospace, automotive, industrial, medical devices, and others. The highest growth was observed in the electronic segment where the equipment is crucial for the fabrication of several forms of electronic components and semiconductor devices. The industry relies heavily on CVD equipment for important processes such as deposition, diffusion, epitaxy, and etching. Some of the advantages of using the technology include ensuring uniformity, conformality, and precise control of film properties. It is also used in the production of display panels, LED (light-emitting diode) devices, and other electronic components. A result survey concluded that an average American has access to around 10 connected devices in their household.
Report Attributes | Report Details |
---|---|
Report Name | Chemical Vapour Deposition (CVD) Equipment Market |
Market Size in 2024 | USD 26.87 Billion |
Market Forecast in 2034 | USD 57.04 Billion |
Growth Rate | CAGR of 7.82% |
Number of Pages | 214 |
Key Companies Covered | Applied Materials Inc., ASM International N.V., Lam Research Corporation, Tokyo Electron Limited, Veeco Instruments Inc., AIXTRON SE, CVD Equipment Corporation, ULVAC Technologies Inc., Plasma-Therm LLC, SENTECH Instruments GmbH, SPTS Technologies (an Orbotech company), Oxford Instruments plc, Centrotherm AG, Canon Anelva Corporation, Semicore Equipment, Inc., Picosun Group, LPE S.p.A., Ningbo Deyi High-Technology Development Co., Ltd., Denton Vacuum LLC, Mustang Vacuum Systems, Soleras Advanced Coatings, EVATEC AG, Hauzer Techno Coating, and Angstrom Engineering Inc., and others. |
Segments Covered | By Type, By Material Type, By Technology, By Application, By End-user, and By Region |
Regions Covered | North America, Europe, Asia Pacific (APAC), Latin America, The Middle East and Africa (MEA) |
Base Year | 2024 |
Historical Year | 2020 to 2023 |
Forecast Year | 2025 - 2034 |
Customization Scope | Avail customized purchase options to meet your exact research needs. Request For Customization |
Asia-Pacific to continue its dominance
The global chemical vapour deposition (CVD) equipment market is expected to witness the highest growth in the Asia-Pacific region during the forecast period. The region has already dominated the industry in the last few years. The high growth rate is mainly driven by the presence of a well-established semiconductor industry in countries such as Taiwan, China, India, and Japan. One of the largest suppliers of semiconductors to the global electronics market is Taiwan. As indicated by The Register, the country controlled over 61% of the world's capacity to produce chips that are under 16 nm process nodes.
Furthermore, the region is witnessing intensive research on developing more efficient and advanced CVD equipment to keep up with changing demand and requirements in the commercial market. The presence of key players and growing end-verticals applications, such as in the electric vehicle and electronics segment, is also crucial to the regional expansion. The region emphasizes innovation and technological advancements which could lead to higher growth.
The report provides a company market share analysis to give a broader overview of the key market players. In addition, the report also covers key strategic developments of the market, including acquisitions & mergers, new product launches, agreements, partnerships, collaborations & joint ventures, research & development, and regional expansion of major participants involved in the chemical vapour deposition (CVD) equipment market on a global and regional basis.
The global chemical vapour deposition (CVD) equipment market is dominated by players like:
The global chemical vapour deposition (CVD) equipment market is segmented as follows;
By Type
By Material Type
By Technology
By Application
By End-user
By Region
FrequentlyAsked Questions
Chemical vapor deposition (CVD) equipment is a manufacturing device used during the process of chemical vapour deposition. In this process, thin films of various materials are deposited on solid substrates, such as silicon wafers.
The global chemical vapor deposition (CVD) equipment market is projected to grow owing to the increasing application of the equipment in one of the fastest-growing and valuable sectors which is the semiconductor industry.
According to a study, the global chemical vapour deposition (CVD) equipment market size was worth around USD 26.87 Billion in 2024 and is expected to reach USD 57.04 Billion by 2034.
The global chemical vapour deposition (CVD) equipment market is expected to grow at a CAGR of 7.82% during the forecast period.
The global chemical vapour deposition (CVD) equipment market is expected to witness the highest growth in Asia-Pacific during the forecast period.
The global chemical vapor deposition (CVD) equipment market is led by players like Applied Materials Inc., ASM International N.V., Lam Research Corporation, Tokyo Electron Limited, Veeco Instruments Inc., AIXTRON SE, CVD Equipment Corporation, ULVAC Technologies Inc., Plasma-Therm LLC, SENTECH Instruments GmbH, SPTS Technologies (an Orbotech company), Oxford Instruments plc, Centrotherm AG, Canon Anelva Corporation, Semicore Equipment, Inc., Picosun Group, LPE S.p.A., Ningbo Deyi High-Technology Development Co., Ltd., Denton Vacuum LLC, Mustang Vacuum Systems, Soleras Advanced Coatings, EVATEC AG, Hauzer Techno Coating, and Angstrom Engineering Inc.
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